Sang Wan Kim, Garam Kim, Wonjoo Kim, Hyoungsoo Ko, Byung-Gook Park
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Abstract
In this paper, a capacitor-less 1T DRAM cell transistor with non-overlap structure and recessed channel is presented. Because of the non-overlap structure between gate and source/drain, GIDL (Gate Induced Drain Leakage) current is efficiently suppressed at hold condition. This results in more than 1 s retention time at 25 °C and 100 ms at 85 °C
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