The Effect of Niobium and Rubidium Doping on the Energy Band Gap of a Lithium Tantalate (LiTaO3) Thin Film

Agus Ismangil, F. A. Noor, T. Winata
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Abstract

Chemical solution deposition (CSD) is a technique for making a film by keeping synthetic arrangements on the outer layer of the substrate. The outcomes show that the band gap energy of the LiTaO3 film is 1 eV. Electrons are more effectively invigorated to the valence band than to the conduction band on the grounds that the energy required is not excessively huge. Niobium-doped LiTaO3 film has a band gap energy of 1.15 eV. A large amount of energy is needed for electrons to be energized from the valence band to the conduction band. The rubidium-doped LiTaO3 film has a band gap energy of 1.30 eV.
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铌铷掺杂对钽酸锂(LiTaO3)薄膜能带隙的影响
化学溶液沉积(CSD)是一种通过在衬底外层保持合成排列来制备薄膜的技术。结果表明,LiTaO3薄膜的带隙能为1 eV。电子被激活到价带比到导带更有效,因为所需的能量不是太大。掺铌的LiTaO3薄膜带隙能为1.15 eV。电子从价带被激发到导带需要大量的能量。掺铷的LiTaO3薄膜带隙能量为1.30 eV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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