{"title":"Surface analysis for Si-wafers using total reflection X-ray fluorescence analysis","authors":"W. Berneike, J. Knoth, H. Schwenke, U. Weisbrod","doi":"10.1007/BF00572369","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":12372,"journal":{"name":"Fresenius' Zeitschrift für analytische Chemie","volume":"1 1","pages":"524-526"},"PeriodicalIF":0.0000,"publicationDate":"1989-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"20","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Fresenius' Zeitschrift für analytische Chemie","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1007/BF00572369","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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