Optimization of Electrophoretic Deposition Parameters for Uniform Titanium Oxide Deposition on Conductive Glass Substrate

Abstract

In this investigation, electrophoretic deposition of Titanium Oxide (P25) nanoparticles on Fluorine doped Tin Oxide (FTO) substrate has been studied. Three deposition parameters such as deposition time, deposition distance, and deposition voltage have been varied to get a uniform metal-oxide layer. The rate of deposition has been observed by varying those three parameters. Rate of deposition clearly increases as an effect of increasing deposition time and voltage. On the other hand, rate of deposition decreases by increasing the distance between the substrates. Surface morphology image shows that huge amount of cracks are formed while the amount of deposition increases beyond a certain level. By observing the surface morphology, optimized deposition parameters have been proposed for the deposition of TiO2 for thick microfilm application.