Analog/RF performance comparison of junctionless and dopingless field effect transistor

Chitrakant Sahu, Jaydeep Singh Parmar
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引用次数: 3

Abstract

In this paper, device performance metricsofjunctionless (JL) and dopingless (DL) field effect transistors (FETs) for analog and radio-frequency application are evaluated using technology computer added design (TCAD) tool. It is observed that the DL-FET offers 17% enhancement in ON-current and achieves 1.5 times cutoff frequency along with 10 dB improvement in intrinsic voltage gain in comparison to JL-FET. Hence, DL-FET alleviates the trade-off by simultaneous improvement in gain and bandwidth with less fabrication complexity compare to its device counterpart.
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无结与无掺杂场效应晶体管模拟/射频性能比较
本文利用计算机辅助设计(TCAD)工具对模拟和射频应用中的无结(JL)和无掺杂(DL)场效应晶体管(fet)的器件性能指标进行了评价。与JL-FET相比,DL-FET的导通电流增强了17%,截止频率提高了1.5倍,固有电压增益提高了10 dB。因此,DL-FET通过同时提高增益和带宽来减轻权衡,与器件相比,其制造复杂性更低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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