K. Ryoo, Jeong-Hoon Oh, Hongsik Jeong, Byung-Gook Park
{"title":"Irregular resistive switching characteristics and its mechanism based on NiO unipolar switching resistive random access memory (RRAM)","authors":"K. Ryoo, Jeong-Hoon Oh, Hongsik Jeong, Byung-Gook Park","doi":"10.1109/SNW.2010.5562580","DOIUrl":null,"url":null,"abstract":"Resistive switching characteristics are investigated for NiO resistive switching random access memory (RRAM) by adapting cross-pointed structure. Uniform transition characteristics from high resistive state (HRS) to low resistive state (LRS) are very important to evaluate high reset/set ratio with low switching current. A cell which shows an irregular switching behavior in the initial transition has been discovered and characteristics associated with it have been discussed. In order to prevent these undesirable effects, optimal process conditions have been addressed.","PeriodicalId":6433,"journal":{"name":"2010 Silicon Nanoelectronics Workshop","volume":"24 23 1","pages":"1-2"},"PeriodicalIF":0.0000,"publicationDate":"2010-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 Silicon Nanoelectronics Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SNW.2010.5562580","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
Resistive switching characteristics are investigated for NiO resistive switching random access memory (RRAM) by adapting cross-pointed structure. Uniform transition characteristics from high resistive state (HRS) to low resistive state (LRS) are very important to evaluate high reset/set ratio with low switching current. A cell which shows an irregular switching behavior in the initial transition has been discovered and characteristics associated with it have been discussed. In order to prevent these undesirable effects, optimal process conditions have been addressed.