Reactor Modelling and Analysis of Amorphous Hydrogenated Silicon Deposition by PECVD

Abstract

The behaviour of plasma reactors is complex and affected by a large number of parameters (temperature, pressure, flow rates, power, frequency, etc...). In that context, modeling constitutes a very convenient theoretical approach to analyze the complex parameters influences on the reactors overall performances, in the particular case studied here, amorphous hydrogenated silicon deposition rate profiles on the substrates. This particular study is devoted to a detailed analysis of the reactor behaviour in higher electrical power conditions. It demonstrates that, if relatively simple mechanisms for electron-molecule interactions and gas phase reactions can be used in low power conditions,this do not remain true in higher power conditions where a great number of reactions must be taken into account.