{"title":"Fabrication of Cobalt-Based Nano-Composite Film for Corrosion Mitigation of Copper in Flow Chloride Medium","authors":"V. Chukwuike, R. C. Barik","doi":"10.3390/cmd2040040","DOIUrl":null,"url":null,"abstract":"Corrosion of metals leads to high maintenance costs, as well as potential threats to structural health and safety. Here, we demonstrate the coating of cobalt tungstate (CoWO4) nanoparticles (NPS)/5-mercapto-1-phenyl-1 H-tetrazole derivative (MPT) used as a nano-composite film on Cu surface for the blocking of micropores to hinder the propagation of metastable pits in an aggressive NaCl medium. The mechanism of interaction between the nanoparticles and tetrazole derivative, in addition to the mode of anchoring to the metal surface and blocking the penetration of chloride ions (Cl−), are all investigated. In this investigation, CoWO4 is synthesized via a wet chemical route and thereafter, is combined with MPT at an optimized ratio thus formulating a nano-composite corrosion inhibitor which in solution gets coated on Cu surface. Atomic force and scanning electron microscopic images of the bare Cu reveal dip pits, which by the coating of the nano-composite are suppressed at the nucleation stage during exposure to the aggressive 3.5% NaCl electrolyte under flow conditions. Electrochemical analysis shows high protection of Cu up to 97% efficiency in the presence of the newly formulated nano-composite inhibitor film.","PeriodicalId":10693,"journal":{"name":"Corrosion and Materials Degradation","volume":"1 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2021-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Corrosion and Materials Degradation","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.3390/cmd2040040","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Corrosion of metals leads to high maintenance costs, as well as potential threats to structural health and safety. Here, we demonstrate the coating of cobalt tungstate (CoWO4) nanoparticles (NPS)/5-mercapto-1-phenyl-1 H-tetrazole derivative (MPT) used as a nano-composite film on Cu surface for the blocking of micropores to hinder the propagation of metastable pits in an aggressive NaCl medium. The mechanism of interaction between the nanoparticles and tetrazole derivative, in addition to the mode of anchoring to the metal surface and blocking the penetration of chloride ions (Cl−), are all investigated. In this investigation, CoWO4 is synthesized via a wet chemical route and thereafter, is combined with MPT at an optimized ratio thus formulating a nano-composite corrosion inhibitor which in solution gets coated on Cu surface. Atomic force and scanning electron microscopic images of the bare Cu reveal dip pits, which by the coating of the nano-composite are suppressed at the nucleation stage during exposure to the aggressive 3.5% NaCl electrolyte under flow conditions. Electrochemical analysis shows high protection of Cu up to 97% efficiency in the presence of the newly formulated nano-composite inhibitor film.
金属的腐蚀导致高昂的维护成本,以及对结构健康和安全的潜在威胁。在这里,我们展示了钨酸钴(CoWO4)纳米颗粒(NPS)/5-巯基-1-苯基-1 h -四唑衍生物(MPT)作为纳米复合膜在Cu表面的涂层,用于阻挡微孔,以阻止在腐蚀性NaCl介质中亚稳坑的扩展。研究了纳米颗粒与四氮唑衍生物的相互作用机理,以及它们在金属表面的锚定和阻止氯离子(Cl−)渗透的模式。在本研究中,CoWO4通过湿法化学合成,然后与MPT以最佳配比结合,形成纳米复合缓蚀剂,并在溶液中涂覆在Cu表面。裸露Cu的原子力和扫描电镜图像显示,在流动条件下暴露于具有腐蚀性的3.5% NaCl电解质中,纳米复合材料的涂层在成核阶段抑制了浸出坑。电化学分析表明,新配制的纳米复合阻垢膜对铜的保护效率高达97%。