Crystal orientation control of antimony telluride thermoelectric thin films by oblique deposition

T. Shimojo, Y. Sasaki, M. Takashiri
{"title":"Crystal orientation control of antimony telluride thermoelectric thin films by oblique deposition","authors":"T. Shimojo, Y. Sasaki, M. Takashiri","doi":"10.2978/JSAS.11006","DOIUrl":null,"url":null,"abstract":"We prepared p-type antimony telluride thin films by an oblique deposition at the incident angle ranging from 0º to 80º. We investigated the relationship between the structural and electrical properties of the thin films. As the structural properties, we analyzed cross-section morphology by scanning electron microscope (SEM), and the crystal orientation and crystallite size by x-ray diffraction (XRD) analysis. As the electrical properties, we measured in-plane electrical conductivity, Seebeck coefficient and power factor at room temperature. As a result, we found the thin film at the incident angle of 40° obtained the highest crystal orientation. As the incident angle increased, the crystallite size were enhanced but the power factor decreased. The power factor of thin film at the incident angle of 0° was 1.26 μW / ( cm · K 2 ) and thin film at the incident angle of 80° was 0.38 μW / ( cm · K 2 ).","PeriodicalId":14991,"journal":{"name":"Journal of Advanced Science","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-12-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Advanced Science","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2978/JSAS.11006","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

We prepared p-type antimony telluride thin films by an oblique deposition at the incident angle ranging from 0º to 80º. We investigated the relationship between the structural and electrical properties of the thin films. As the structural properties, we analyzed cross-section morphology by scanning electron microscope (SEM), and the crystal orientation and crystallite size by x-ray diffraction (XRD) analysis. As the electrical properties, we measured in-plane electrical conductivity, Seebeck coefficient and power factor at room temperature. As a result, we found the thin film at the incident angle of 40° obtained the highest crystal orientation. As the incident angle increased, the crystallite size were enhanced but the power factor decreased. The power factor of thin film at the incident angle of 0° was 1.26 μW / ( cm · K 2 ) and thin film at the incident angle of 80° was 0.38 μW / ( cm · K 2 ).
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
倾斜沉积法控制碲化锑热电薄膜的晶体取向
我们在0º~ 80º的入射角范围内采用斜沉积法制备了p型碲化锑薄膜。我们研究了薄膜的结构和电学性能之间的关系。通过扫描电镜(SEM)和x射线衍射(XRD)分析了晶体的取向和晶粒尺寸。电学性能方面,我们测量了室温下的面内电导率、塞贝克系数和功率因数。结果表明,当入射角为40°时,薄膜的晶体取向最高。随着入射角的增大,晶体尺寸增大,功率因数减小。入射角度为0°时,薄膜的功率因数为1.26 μW / (cm·K 2),入射角度为80°时,薄膜的功率因数为0.38 μW / (cm·K 2)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
LaNi5/V 薄膜上におけるCO2のメタン化 Selective synthesis of TiO2 nanocrystals and preparation of their dispersions for the electron transport layer of perovskite solar cells カフェインによるコマツナの生理障害の解消方法についての検討 Deposition of AlN thin film at room temperature by pressure gradient sputtering and evaluation of practicality by 3ω method Effect of EB treatment on permeation enhancement of palladium-free hydrogen purification membrane of SUS316L
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1