The Interplay of Processing-Related Influences on the Formation of Volume Holographic Gratings in a Free-Surface Epoxy-Based Recording Material

Macromol Pub Date : 2023-05-09 DOI:10.3390/macromol3020013
Tina Sabel-Grau
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Abstract

Understanding the formation processes of holographic gratings in polymers as a function of material composition and processing is important for the development of new materials for holography and its associated applications. Among the processing-related factors that affect grating formation in volume holographic recording material, pre-exposure, prebaking and dark storage, as well as the associated variations in layer thickness and composition, are usually underestimated. This study highlights the influence and interaction of these factors and shows that they should not be neglected. This is of particular importance for samples with a free surface. Here, one such epoxy-based free-surface material is investigated. To determine the influence of prebaking on the holographic grating formation, as well as on the achieved refractive index contrast, angular resolved analysis of volume holographic phase gratings is applied through point-by-point scanning of the local material response. Grating characteristics are determined by comparison with simulations based on rigorous coupled wave theory. Thus, the optimal dose for prebaking can be determined, as well as the optimal exposure time, depending on the dose. The influence of dark storage on the material response is investigated over a period of 12 weeks and shows a strong dependence on the deposited energy density.
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加工对自由表面环氧基记录材料中体全息光栅形成的相互影响
了解聚合物中全息光栅的形成过程作为材料组成和加工的功能,对于全息新材料及其相关应用的开发具有重要意义。在影响体全息记录材料中光栅形成的加工相关因素中,预曝光、预烘烤和暗储存以及相关的层厚度和组成变化通常被低估。本研究强调了这些因素的影响和相互作用,表明它们不应被忽视。这对于具有自由表面的样品尤其重要。在这里,研究了一种这样的环氧基自由表面材料。为了确定预焙对全息光栅形成和折射率对比度的影响,通过逐点扫描局部材料响应,对体全息相位光栅进行角分辨分析。基于严格耦合波理论,通过与仿真结果的比较,确定了光栅的特性。因此,可以根据剂量确定预焙的最佳剂量以及最佳暴露时间。暗存储对材料响应的影响在12周的时间内进行了研究,结果表明,暗存储对沉积的能量密度有很强的依赖性。
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