Charge state fractions of sputtered Ni

H.-J. Barth, E. Mühling, W. Eckstein
{"title":"Charge state fractions of sputtered Ni","authors":"H.-J. Barth,&nbsp;E. Mühling,&nbsp;W. Eckstein","doi":"10.1016/0378-5963(85)90045-5","DOIUrl":null,"url":null,"abstract":"<div><p>Energy distributions of sputtered Ni ions and neutrals were measured at non-normal incidence of Ne and Ar ions. Only the Ni particles sputtered in a binary collision can be used for the determination of the charge state fractions. Monte Carlo simulations (TRIM SP) were used for the absolute calibration of the total intensity in the binary recoil peak. The charged fractions are found to be less than 10% for energies below 5 keV. The positive fraction is about one order of magnitude larger than the negative and the doubly charged fractions.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 136-144"},"PeriodicalIF":0.0000,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90045-5","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applications of Surface Science","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0378596385900455","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Energy distributions of sputtered Ni ions and neutrals were measured at non-normal incidence of Ne and Ar ions. Only the Ni particles sputtered in a binary collision can be used for the determination of the charge state fractions. Monte Carlo simulations (TRIM SP) were used for the absolute calibration of the total intensity in the binary recoil peak. The charged fractions are found to be less than 10% for energies below 5 keV. The positive fraction is about one order of magnitude larger than the negative and the doubly charged fractions.

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
溅射镍的电荷态分数
在非正态入射下,测量了溅射Ni离子和中性离子的能量分布。只有在二元碰撞中溅射的Ni粒子才能用于电荷态分数的测定。采用蒙特卡罗模拟(TRIM SP)对双后坐力峰的总强度进行了绝对标定。发现能量低于5kev的带电分数小于10%。正电荷部分大约比负电荷部分和双电荷部分大一个数量级。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Editorial Board Subject index Author index Preface Effect of different methods of oxidation on SiSiO2 interface state properties
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1