Cu-Local Structures and Their Relation with Nanoscale Electrical Performance in CdTe

Srisuda Rojsatien, T. Walker, T. Nietzold, B. Lai, E. Colegrove, M. Stuckelberger, A. K. Kanakkithodi, M. Chan, M. Bertoni
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引用次数: 1

Abstract

For decades, copper has been introduced in CdTe devices to improve overall performance (open circuit voltage, fill factor, and series resistance). While multiple articles have reported on Cu-based defects, very little is known about how the local structure around the copper atom affects electrical performance. Using X-ray Absorption Near Edge Structure (XANES) coupled with X-ray microscopy we investigate good and poor performing region in Cu-doped CdTe devices. Our XANES coupled with theoretical standards by FEFF9 suggest that CU2Te phase and CuCdmay be responsible for the high electrical performance of the regions under study. This correlation of structure-performance at the nanoscale offers a unique framework to understand and tune processes with deep implications to the overall electrical performance of the solar cell.
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CdTe中cu局部结构及其与纳米电性能的关系
几十年来,铜被引入CdTe器件以提高整体性能(开路电压、填充系数和串联电阻)。虽然有多篇文章报道了铜基缺陷,但对铜原子周围的局部结构如何影响电性能知之甚少。利用x射线吸收近边结构(XANES)和x射线显微镜研究了cu掺杂CdTe器件中表现良好和较差的区域。我们的XANES与FEFF9的理论标准相结合表明,CU2Te相和cu可能是研究区域的高电性能的原因。这种纳米级结构-性能的相关性为理解和调整对太阳能电池整体电性能具有深远影响的过程提供了一个独特的框架。
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