S. Maltezos, E. Fokitis, D. Kouzis-Loukas, R. Liarokapi
{"title":"HIGH PERFORMANCE MULTILAYER NOTCH OPTICAL FILTERS FOR HIGH ENERGY DETECTOR APPLICATIONS AND THEIR COATING PROCESS CONTROL","authors":"S. Maltezos, E. Fokitis, D. Kouzis-Loukas, R. Liarokapi","doi":"10.1142/9789812702708_0043","DOIUrl":null,"url":null,"abstract":"High-performance and precision multilayer notch optical filters, designed and optimized to be used in high energy detector applications, are presented. As two typical examples, we present filters operating in the near UV and far UV range for air-fluorescence and RICH detectors, respectively. A proposed, improved coating process algorithm of optical monitoring during the fabrication of such filters has been developed and simulated. A prototype spectrograph equipped with fast readout electronics has been developed, aiming to be used for the thin film layer control in deposition plants.","PeriodicalId":0,"journal":{"name":"","volume":" ","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1142/9789812702708_0043","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
High-performance and precision multilayer notch optical filters, designed and optimized to be used in high energy detector applications, are presented. As two typical examples, we present filters operating in the near UV and far UV range for air-fluorescence and RICH detectors, respectively. A proposed, improved coating process algorithm of optical monitoring during the fabrication of such filters has been developed and simulated. A prototype spectrograph equipped with fast readout electronics has been developed, aiming to be used for the thin film layer control in deposition plants.