室温量子应用的薄膜材料

Farhana Anwar;Rafee Mahbub;Ronald A. Coutu
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引用次数: 0

摘要

具有量子缺陷的薄膜正在成为量子应用的潜在平台。某些薄膜中的量子缺陷是由结构缺陷引起的,如空位或杂质。这些缺陷产生具有独特光学和电子特性的局域电子态。当晶格中缺少原子时,晶体空缺或缺陷会影响材料的量子特性。在这项研究中,我们研究了适合室温应用的具有量子缺陷的廉价互补金属氧化物半导体兼容材料。实验表明,氮化铝、氧化铝和氧化锡的弛豫时间分别为5、15和17 ns。对于所有这些材料,在室温(即21°C)下,在大约1.1、1.6、2.2和2.7 GHz处观察到不同的谐振峰。这些峰表现出轻微的频移,与已知的缺陷位置和薄膜材料特性相对应。这一发现可能会为我们的日常生活带来可靠、经济的量子应用。
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Thin Film Materials for Room Temperature Quantum Applications
Thin films with quantum defects are emerging as a potential platform for quantum applications. Quantum defects in some thin films arise due to structural imperfections, such as vacancies or impurities. These defects generate localized electronic states with unique optical and electronic properties. Crystal vacancies or defects that occur when atoms are missing from a crystal lattice can influence a material's quantum properties. In this study, we investigated inexpensive, complementary metal oxide semiconductor compatible materials with quantum defects suitable for room temperature applications. The experiments indicated 5, 15, and 17 ns relaxation times for aluminum nitride, aluminum oxide or alumina, and tin oxides, respectively. For all these materials, distinct resonant peaks are observed at approximately 1.1, 1.6, 2.2, and 2.7 GHz at room temperature (i.e., 21 °C). These peaks exhibit slight frequency shifts, corresponding to known defect locations and thin film material properties. This discovery may lead the way to reliable, cost-effective quantum applications in our daily lives.
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