低散射光学技术规范

J. Stover
{"title":"低散射光学技术规范","authors":"J. Stover","doi":"10.1364/oft.1990.othc1","DOIUrl":null,"url":null,"abstract":"The 1970’s and 80’s generated considerable concern over scatter in optical systems. Although it was often recognized in advance that low scatter optics were required for a given application, the specifications were usually either non-existent (a best effort requirement) or inappropriate. The easiest, most available and cheapest scatter measurement was the Total Integrated Scatter (TIS) measurement. Until the mid-1980’s most of the specifications written to handle scatter concerns were either TIS (often given without angle limits) or rms roughness found from some sort of profile data (and given without the corresponding spatial frequency limits).","PeriodicalId":354934,"journal":{"name":"Optical Fabrication and Testing","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Specifications for Low Scatter Optics\",\"authors\":\"J. Stover\",\"doi\":\"10.1364/oft.1990.othc1\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The 1970’s and 80’s generated considerable concern over scatter in optical systems. Although it was often recognized in advance that low scatter optics were required for a given application, the specifications were usually either non-existent (a best effort requirement) or inappropriate. The easiest, most available and cheapest scatter measurement was the Total Integrated Scatter (TIS) measurement. Until the mid-1980’s most of the specifications written to handle scatter concerns were either TIS (often given without angle limits) or rms roughness found from some sort of profile data (and given without the corresponding spatial frequency limits).\",\"PeriodicalId\":354934,\"journal\":{\"name\":\"Optical Fabrication and Testing\",\"volume\":\"23 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical Fabrication and Testing\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/oft.1990.othc1\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Fabrication and Testing","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/oft.1990.othc1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

20世纪70年代和80年代对光学系统中的散射产生了相当大的关注。虽然通常提前认识到,对于给定的应用程序需要低散射光学,但规格通常要么不存在(尽力而为的要求),要么不合适。最简单、最有效和最便宜的散点测量是总积分散点(TIS)测量。直到20世纪80年代中期,为处理散射问题而编写的大多数规范要么是TIS(通常没有给出角度限制),要么是从某种剖面数据中发现的均方根粗糙度(并且没有给出相应的空间频率限制)。
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Specifications for Low Scatter Optics
The 1970’s and 80’s generated considerable concern over scatter in optical systems. Although it was often recognized in advance that low scatter optics were required for a given application, the specifications were usually either non-existent (a best effort requirement) or inappropriate. The easiest, most available and cheapest scatter measurement was the Total Integrated Scatter (TIS) measurement. Until the mid-1980’s most of the specifications written to handle scatter concerns were either TIS (often given without angle limits) or rms roughness found from some sort of profile data (and given without the corresponding spatial frequency limits).
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