{"title":"等离子体刻蚀微腔直线马赫-曾德尔干涉仪折射率传感特性的调谐","authors":"M. Janik, M. Koba, W. Bock, M. Śmietana","doi":"10.1117/12.2265755","DOIUrl":null,"url":null,"abstract":"This work presents an application of reactive ion etching (RIE) for an effective tuning of the spectral response and the refractive-index (RI) sensitivity of the micro-cavity in-line Mach-Zehnder interferometer (μIMZI). The μIMZIs were fabricated using femtosecond laser micromachining in a standard single-mode fiber as a form circular holes with a diameter of 54 μm. The application of RIE with SF6 and O2 used as reactive gas allows for an efficient and well-controlled etching of the fabricated structure. The process resulted in cleaning the bottom of the micro-cavity and smoothening of its sidewalls. In transmission measurements, the effect of the plasma processing was observed as an increase in both spectral depths of the minima and RI sensitivity of the structure, as well as improved wettability of the micro-cavity surface, which made the measurements faster and easier.","PeriodicalId":198716,"journal":{"name":"2017 25th Optical Fiber Sensors Conference (OFS)","volume":"49 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Tuning refractive index sensing properties of micro-cavity in-line Mach-Zehnder interferometer with plasma etching\",\"authors\":\"M. Janik, M. Koba, W. Bock, M. Śmietana\",\"doi\":\"10.1117/12.2265755\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This work presents an application of reactive ion etching (RIE) for an effective tuning of the spectral response and the refractive-index (RI) sensitivity of the micro-cavity in-line Mach-Zehnder interferometer (μIMZI). The μIMZIs were fabricated using femtosecond laser micromachining in a standard single-mode fiber as a form circular holes with a diameter of 54 μm. The application of RIE with SF6 and O2 used as reactive gas allows for an efficient and well-controlled etching of the fabricated structure. The process resulted in cleaning the bottom of the micro-cavity and smoothening of its sidewalls. In transmission measurements, the effect of the plasma processing was observed as an increase in both spectral depths of the minima and RI sensitivity of the structure, as well as improved wettability of the micro-cavity surface, which made the measurements faster and easier.\",\"PeriodicalId\":198716,\"journal\":{\"name\":\"2017 25th Optical Fiber Sensors Conference (OFS)\",\"volume\":\"49 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-04-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 25th Optical Fiber Sensors Conference (OFS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2265755\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 25th Optical Fiber Sensors Conference (OFS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2265755","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Tuning refractive index sensing properties of micro-cavity in-line Mach-Zehnder interferometer with plasma etching
This work presents an application of reactive ion etching (RIE) for an effective tuning of the spectral response and the refractive-index (RI) sensitivity of the micro-cavity in-line Mach-Zehnder interferometer (μIMZI). The μIMZIs were fabricated using femtosecond laser micromachining in a standard single-mode fiber as a form circular holes with a diameter of 54 μm. The application of RIE with SF6 and O2 used as reactive gas allows for an efficient and well-controlled etching of the fabricated structure. The process resulted in cleaning the bottom of the micro-cavity and smoothening of its sidewalls. In transmission measurements, the effect of the plasma processing was observed as an increase in both spectral depths of the minima and RI sensitivity of the structure, as well as improved wettability of the micro-cavity surface, which made the measurements faster and easier.