硅MOSFET的低温复合寿命

B. Zetterlund, A. Steckl
{"title":"硅MOSFET的低温复合寿命","authors":"B. Zetterlund, A. Steckl","doi":"10.1109/IEDM.1980.189815","DOIUrl":null,"url":null,"abstract":"The recombination lifetime, τ<inf>r</inf>, has been measured at low temperature in Si p-MOSFET's using charge pumping. Measurements were performed over the 40-300°K range. A monotonically increasing lifetime with decreasing temperature was measured. τ<inf>r</inf>was found to be proportional to exp(A<inf>r</inf>/kT), where A<inf>r</inf>is a constant determined from the slope of lnτ vs. l/T. For a typical MOSFET the lifetime ranged from 0.08 µs at 300°K to 0.37 ms at 100°K. The value of A<inf>r</inf>in this case was determined to be 106 meV.","PeriodicalId":180541,"journal":{"name":"1980 International Electron Devices Meeting","volume":"35 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Low temperature recombination lifetime in Si MOSFET's\",\"authors\":\"B. Zetterlund, A. Steckl\",\"doi\":\"10.1109/IEDM.1980.189815\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The recombination lifetime, τ<inf>r</inf>, has been measured at low temperature in Si p-MOSFET's using charge pumping. Measurements were performed over the 40-300°K range. A monotonically increasing lifetime with decreasing temperature was measured. τ<inf>r</inf>was found to be proportional to exp(A<inf>r</inf>/kT), where A<inf>r</inf>is a constant determined from the slope of lnτ vs. l/T. For a typical MOSFET the lifetime ranged from 0.08 µs at 300°K to 0.37 ms at 100°K. The value of A<inf>r</inf>in this case was determined to be 106 meV.\",\"PeriodicalId\":180541,\"journal\":{\"name\":\"1980 International Electron Devices Meeting\",\"volume\":\"35 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1980 International Electron Devices Meeting\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.1980.189815\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1980 International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1980.189815","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

摘要

用电荷泵浦法测量了低温下Si - p-MOSFET的复合寿命τr。测量在40-300°K范围内进行。寿命随温度的降低而单调增加。发现τr与exp(Ar/kT)成正比,其中Aris是由lnτ对l/T的斜率确定的常数。对于典型的MOSFET,其寿命范围从300°K时的0.08µs到100°K时的0.37 ms。在这种情况下,Arin的值被确定为106 meV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Low temperature recombination lifetime in Si MOSFET's
The recombination lifetime, τr, has been measured at low temperature in Si p-MOSFET's using charge pumping. Measurements were performed over the 40-300°K range. A monotonically increasing lifetime with decreasing temperature was measured. τrwas found to be proportional to exp(Ar/kT), where Aris a constant determined from the slope of lnτ vs. l/T. For a typical MOSFET the lifetime ranged from 0.08 µs at 300°K to 0.37 ms at 100°K. The value of Arin this case was determined to be 106 meV.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Circuitless electron beam amplifier (CEBA) Transverse modal behavior of transverse junction stripe laser excited by short electrical pulse Matrix addressing flat-panel displays Simulating VLSI wafer topography Experimental evaluation of PPM focussed electron beams
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1