多晶硅太阳电池缺陷区域的温度依赖性光致发光成像和表征

S. Johnston, Fei Yan, Jian V. Li, K. Zaunbrecher, M. Romero, M. Al‐Jassim, O. Sidelkheir, A. Blosse
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引用次数: 4

摘要

光致发光(PL)成像用于检测多晶硅中由于高复合而在带对带成像中呈现黑暗的区域。稳态PL强度可以与有效的少数载流子寿命相关,其温度依赖性可以提供额外的寿命限制缺陷信息。从多晶硅太阳能电池上用激光切割出了一个高缺陷密度的区域。波段到波段和缺陷波段的PL成像都是作为温度从~ 85到350 K的函数收集的。采用1200 nm的短通滤波器采集InGaAs相机的带间发光,采用1350 nm的长通滤波器采集缺陷带发光。缺陷带的发光特征为阴极发光。用深能级瞬态光谱(DLTS)测量同一晶圆内邻近区域的小块。DLTS检测到含有成像缺陷的样品上具有0.45 eV活化能的少数载流子电子陷阱能级。
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Temperature-dependent Photoluminescence imaging and characterization of a multi-crystalline silicon solar cell defect area
Photoluminescence (PL) imaging is used to detect areas in multi-crystalline silicon that appear dark in band-to-band imaging due to high recombination. Steady-state PL intensity can be correlated to effective minority-carrier lifetime, and its temperature dependence can provide additional lifetime-limiting defect information. An area of high defect density has been laser cut from a multi-crystalline silicon solar cell. Both band-to-band and defect-band PL imaging have been collected as a function of temperature from ∼85 to 350 K. Band-to-band luminescence is collected by an InGaAs camera using a 1200-nm short-pass filter, while defect band luminescence is collected using a 1350-nm long pass filter. The defect band luminescence is characterized by cathodoluminescence. Small pieces from adjacent areas within the same wafer are measured by deep-level transient spectroscopy (DLTS). DLTS detects a minority-carrier electron trap level with an activation energy of 0.45 eV on the sample that contained defects as seen by imaging.
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