真空电弧离子源在GSI向单腔腔注入大电流铀离子束的研制

R. Hollinger, M. Galonska, P. Spadtke
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引用次数: 24

摘要

为了用铀离子填补GSI重离子同步加速器(US)的空间电荷极限,在MEVVA IV离子源的基础上研制了一种新型真空电弧离子源(VARIS)并投入运行。该离子源在GSI的大电流注入器中进行了多次长周期束流试验,证明了其性能。使用新的离子源,首次有可能在直线加速器(UN1LAC)入口处超过15 mA U4+离子的空间电荷限制。可靠性和噪声性能都得到了很大的改善,这种离子源可以毫无异议地用于加速器的注入。在本文中,我们用最重要的操作数据介绍了离子源的改进。新离子源的发射电流密度从常用的GSI-MEVVA的60 mA/cm2提高到170 mA/cm2。这就产生了35kv下156 mA的全束离子电流,其中铀离子的四倍电荷率为67%。经直流后加速后的U4+离子束在131 kV下达到25 mA,比RFQ入口要求的离子束电流高1.7倍。降低了真空电弧的功率密度,提高了效率,延长了寿命。产生磁场以增强离子电荷状态的螺线管不再放置在真空系统内。这种离子源设计可以在注入器更换离子源后获得更高的可用性,并延长使用寿命。
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Development of a vacuum arc ion source for injection of high current uranium ion beam into the unilac at GSI
To fill up the GSI heavy ion synchrotron (US) to its space charge limit with uranium ions, a new vacuum arc ion source (VARIS), based on the MEVVA IV ion source has been developed and implemented into operation. The ion source has proven its capability in several long period beam times at the high current injector at GSI. With the new ion source it was possible to exceed the space charge limit of 15 mA U4+ ions at the entrance of the linear accelerator (UN1LAC)for the very first time. The reliability as well as the noise behaviour has been improved to such a degree, that this ion source can be used for injection info an accelerator without objection. In this article we present the improvements of the ion Source with the most important operational data. The emission current density of the new ion source has been increased from 60 mA/cm2 for the common used GSI-MEVVA to 170 mA/cm2. This results in a full beam ion current of 156 mA at 35 kV with a fraction of four fold charged uranium ions of 67%. The analysed U4+ ion beam after dc post acceleration amounts to 25 mA at 131 kV which is 1.7 times higher than the requested ion beam current at the entrance of the RFQ. The reduced power density of the vacuum arc results in a higher efficiency and longer life time. Solenoids which are creating magnetic fields to enhance the charge state of the ions are no more placed inside the vacuum system. This ion source design results in a higher availability after ion source replacement at the injector, and longer life time.
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