需求是发明之母:CD控制的支持向量机

C. Bürgel, M. Sczyrba, C. Utzny
{"title":"需求是发明之母:CD控制的支持向量机","authors":"C. Bürgel, M. Sczyrba, C. Utzny","doi":"10.1117/12.2535745","DOIUrl":null,"url":null,"abstract":"The currently increasing demand for photo-masks in the regime of the 14nm technology drives many initiatives towards capacity and throughput increase of existing production line. Such improvements are facilitated by improved control mechanisms of the tools and processes used within a production line. While process control of long range parameters such as the average CD behavior is demanding yet conceptually well understood, other parameters such as the small scales CD properties are quite often elusive to process control. These properties often require a dedicated test mask to be processed in order to be validated. In this paper we introduce a systematic approach towards a product based monitoring of small scale CD behavior which uses a CD characteristic extracted from the defect inspection process. This characteristic represents the influence of CD relevant processes starting from 200m up to 4000 m. Large variations in the scale and magnitude of the CD characteristic are induced by layout specific design variations. However, the shape of these distinct curves is remarkably similar, which enables their use for monitoring as well as controlling the mask processes on the above stated spatial scales. In this paper it is demonstrated, that a meaningful process evaluation can be performed by using the classification capabilities of the support vector machines. The small scales CD characteristics presented in figure 1 originate from two distinct tools. Matching of the two tools can be assessed by training a support vector machine to classify the small scales CD characteristics according to their origin. The classification performance on the resampled training set as well as on the validation set is a robust measure for tool matching. The results of this approach are depicted in figure 2. The left panel shows the AUC statistics of bootstrapping resamples for tool comparison “A”. In this case no noticeable difference between the two tools is found (an average AUC of 0.55 suggest no learnable difference). This is contrasted by the tool comparison “B”, here the classifier has an average AUC of 0.75, indicating a learnable difference in the tool performances. This result is backed by the process understand of both tool types.","PeriodicalId":287066,"journal":{"name":"European Mask and Lithography Conference","volume":"16 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-08-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Necessity is the mother of invention: support vector machines for CD control\",\"authors\":\"C. Bürgel, M. Sczyrba, C. Utzny\",\"doi\":\"10.1117/12.2535745\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The currently increasing demand for photo-masks in the regime of the 14nm technology drives many initiatives towards capacity and throughput increase of existing production line. Such improvements are facilitated by improved control mechanisms of the tools and processes used within a production line. While process control of long range parameters such as the average CD behavior is demanding yet conceptually well understood, other parameters such as the small scales CD properties are quite often elusive to process control. These properties often require a dedicated test mask to be processed in order to be validated. In this paper we introduce a systematic approach towards a product based monitoring of small scale CD behavior which uses a CD characteristic extracted from the defect inspection process. This characteristic represents the influence of CD relevant processes starting from 200m up to 4000 m. Large variations in the scale and magnitude of the CD characteristic are induced by layout specific design variations. However, the shape of these distinct curves is remarkably similar, which enables their use for monitoring as well as controlling the mask processes on the above stated spatial scales. In this paper it is demonstrated, that a meaningful process evaluation can be performed by using the classification capabilities of the support vector machines. The small scales CD characteristics presented in figure 1 originate from two distinct tools. Matching of the two tools can be assessed by training a support vector machine to classify the small scales CD characteristics according to their origin. The classification performance on the resampled training set as well as on the validation set is a robust measure for tool matching. The results of this approach are depicted in figure 2. The left panel shows the AUC statistics of bootstrapping resamples for tool comparison “A”. In this case no noticeable difference between the two tools is found (an average AUC of 0.55 suggest no learnable difference). This is contrasted by the tool comparison “B”, here the classifier has an average AUC of 0.75, indicating a learnable difference in the tool performances. This result is backed by the process understand of both tool types.\",\"PeriodicalId\":287066,\"journal\":{\"name\":\"European Mask and Lithography Conference\",\"volume\":\"16 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-08-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"European Mask and Lithography Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2535745\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"European Mask and Lithography Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2535745","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

目前,在14nm技术体制下,对光掩模的需求不断增长,推动了现有生产线产能和吞吐量增加的许多举措。在生产线上使用的工具和过程的改进控制机制促进了这种改进。虽然长范围参数(如平均CD行为)的过程控制要求很高,但在概念上很好理解,但其他参数(如小尺度CD特性)通常难以捉摸。为了验证这些属性,通常需要处理专用的测试掩码。本文介绍了一种利用缺陷检测过程中提取的缺陷特征对小范围缺陷行为进行监测的系统方法。这一特性代表了从200m到4000m的CD相关过程的影响。CD特性的尺度和幅度的大变化是由布局特定的设计变化引起的。然而,这些不同曲线的形状非常相似,这使得它们能够在上述空间尺度上用于监测和控制掩膜过程。本文证明了利用支持向量机的分类能力可以进行有意义的过程评价。图1所示的小尺度CD特征来源于两个不同的工具。通过训练支持向量机对小尺度CD特征进行分类,可以评估两种工具的匹配程度。在重采样训练集和验证集上的分类性能是工具匹配的鲁棒度量。这种方法的结果如图2所示。左面板显示了工具比较“A”的自举样本的AUC统计信息。在这种情况下,两种工具之间没有发现明显的差异(平均AUC为0.55表明没有可学习的差异)。这与工具比较“B”形成对比,这里分类器的平均AUC为0.75,表明工具性能的可学习差异。这一结果得到了对两种工具类型的过程理解的支持。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Necessity is the mother of invention: support vector machines for CD control
The currently increasing demand for photo-masks in the regime of the 14nm technology drives many initiatives towards capacity and throughput increase of existing production line. Such improvements are facilitated by improved control mechanisms of the tools and processes used within a production line. While process control of long range parameters such as the average CD behavior is demanding yet conceptually well understood, other parameters such as the small scales CD properties are quite often elusive to process control. These properties often require a dedicated test mask to be processed in order to be validated. In this paper we introduce a systematic approach towards a product based monitoring of small scale CD behavior which uses a CD characteristic extracted from the defect inspection process. This characteristic represents the influence of CD relevant processes starting from 200m up to 4000 m. Large variations in the scale and magnitude of the CD characteristic are induced by layout specific design variations. However, the shape of these distinct curves is remarkably similar, which enables their use for monitoring as well as controlling the mask processes on the above stated spatial scales. In this paper it is demonstrated, that a meaningful process evaluation can be performed by using the classification capabilities of the support vector machines. The small scales CD characteristics presented in figure 1 originate from two distinct tools. Matching of the two tools can be assessed by training a support vector machine to classify the small scales CD characteristics according to their origin. The classification performance on the resampled training set as well as on the validation set is a robust measure for tool matching. The results of this approach are depicted in figure 2. The left panel shows the AUC statistics of bootstrapping resamples for tool comparison “A”. In this case no noticeable difference between the two tools is found (an average AUC of 0.55 suggest no learnable difference). This is contrasted by the tool comparison “B”, here the classifier has an average AUC of 0.75, indicating a learnable difference in the tool performances. This result is backed by the process understand of both tool types.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Synergy between quantum computing and semiconductor technology New registration calibration strategies for MBMW tools by PROVE measurements OPC flow for non-conventional layouts: specific application to optical diffusers Lithographic performance of resist ma-N 1402 in an e-beam/i-line stepper intra-level mix and match approach High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1