胶体量子点光电二极管阵列室温SWIR传感

E. Klem, Jay S. Lewis, C. Gregory, Garry B. Cunningham, D. Temple, A. D'Souza, E. Robinson, P. Wijewarnasuriya, N. Dhar
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引用次数: 6

摘要

虽然基于ingaas的焦平面阵列(fpa)为SWIR成像应用提供了出色的探测性和低噪声,但能够在该光谱范围内工作的系统的更广泛采用受到高成本,有限的光谱响应以及与Si ROIC器件的昂贵集成的限制。RTI已经展示了一种基于红外吸收溶液处理的PbS胶体量子点(CQD)的新型光电二极管技术,该技术可以克服InGaAs fpa的这些局限性。CQD技术最大的优点是易于制造。该器件可以在与CMOS兼容的低温下直接在ROIC衬底上制造,并且可以在晶圆规模上制造阵列。此外,设备性能不会随着像素尺寸的减小而显著降低。我们展示了在Si衬底上制作的向上看探测器的结果,其灵敏度从UV到~1.7µm。我们进一步展示了用更大尺寸的CQDs制造的器件,其光谱灵敏度从UV延伸到2 μ m。
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Room temperature SWIR sensing from colloidal quantum dot photodiode arrays
While InGaAs-based focal plane arrays (FPAs) provide excellent detectivity and low noise for SWIR imaging applications, wider scale adoption of systems capable of working in this spectral range is limited by high costs, limited spectral response, and costly integration with Si ROIC devices. RTI has demonstrated a novel photodiode technology based on IR-absorbing solution-processed PbS colloidal quantum dots (CQD) that can overcome these limitations of InGaAs FPAs. The most significant advantage of the CQD technology is ease of fabrication. The devices can be fabricated directly onto the ROIC substrate at low temperatures compatible with CMOS, and arrays can be fabricated at wafer scale. Further, device performance is not expected to degrade significantly with reduced pixel size. We present results for upward-looking detectors fabricated on Si substrates with sensitivity from the UV to ~1.7 µm. We further show devices fabricated with larger size CQDs that exhibit spectral sensitivity that extends from UV to 2 µm.
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