低能辅助离子轰击非晶Ta2O5薄膜的光学性质和机械损耗

Optical Interference Coatings Conference (OIC) 2019 Pub Date : 2019-06-02 DOI:10.1364/OIC.2019.FA.6

Le Yang, E. Randel, G. Vajente, A. Ananyeva, E. Gustafson, A. Markosyan, R. Bassiri, M. Fejer, C. Menoni

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引用次数: 0

摘要

采用低能辅助Ar+或Ar++O2+轰击反应离子束溅射制备了非晶态钽(Ta2O5)薄膜。离子轰击对薄膜的吸收和机械损耗影响不大。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Optical properties and mechanical loss of amorphous Ta2O5 thin films bombarded with low energy assist ions

Amorphous tantala (Ta2O5) thin films were deposited by reactive ion beam sputtering with simultaneous low energy assist Ar+ or Ar++O2+ bombardment. The films absorption and mechanical losses are not significantly affected by the ion bombardment.

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Optical Interference Coatings Conference (OIC) 2019

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