稍微倾斜离轴通道(110)的N-和p - mosfet的电特性

H. Momose, S. Yoshitomi, K. Kojima, T. Ohguro, Y. Toyoshima, H. Ishiuchi
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引用次数: 2

摘要

首次研究了2-6度倾斜离轴通道(110)的n-和p- mosfet的Si表面特性和电学特性。离轴沟道的p-MOSFET在(110)平面上的跨导率明显低于正常沟道,而n-MOSFET的跨导率略高于正常沟道。这些变化比在稍微离轴(100)的样本中观察到的更大。(110)样品的栅漏电流和1/f噪声对离轴角敏感。
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Electrical Characteristics in N- and P-MOSFETS with Slightly Tilted Off-Axis (110) Channel
Si surface properties and electrical characteristics in n- and p-MOSFETs with 2-6 degree tilted off-axis (110) channel were investigated for the first time. The transconductance of p-MOSFET with off-axis channel was significantly degraded than that of normal channel on (110) plane, whereas that of n-MOSFET was slightly improved than that of normal channel. The changes were larger than those observed in slightly off-axis (100) samples. It was also found that the gate leakage current and 1/f noise in (110) samples were sensitive to off-axis angle.
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