用于混合焦平面阵列的LWIR HgCdTe光伏探测器

K. Riley
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引用次数: 0

摘要

高性能第二代红外成像系统需要高密度焦平面阵列,该阵列采用混合配置的HgCdTe光电二极管进行光子检测和Si CCD信号处理器。系统性能的限制是由输入电路和检测器的要求建立的。本文将讨论LWIR光电二极管在8-12µm光谱范围内的性能。采用离子注入和液相外延异质结两种基本技术制备了低波长红外高碲化镉光电二极管。在8-12µm区域,暗电流组分包括扩散电流、产生复合电流、隧道电流和表面漏电流。通过适当选择材料参数和器件设计,这些组件中的每一个都可以最小化,从而使性能最大化。在本文中,权衡分析,包括薄基横向扩散(tld)以及异质结(HJ)设计概念,用于最小化暗电流源将被提出。综述了近年来在HgCdTe离子注入和异质结技术方面的研究进展,包括材料生长、表面钝化和器件制造,并将实验结果与预测器件性能进行了比较。
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LWIR HgCdTe photovoltaic detectors for hybrid focal plane arrays
High performance second generation infrared imaging systems require high density focal plane arrays which utilize intrinsic HgCdTe photodiodes for photon detection and Si CCD signal processors in a hybrid configuration. Limitations on system performance are established by both input circuit as well as detector requirements. In the paper performance of LWIR photodiodes in the 8-12 µm spectral region will be discussed. LWIR HgCdTe photodiodes have been fabricated by two basic techniques: ion implantation and liquid phase epitaxial heterojunctions. In the 8-12 µm region dark current components include diffusion, generation-recombination, tunneling and surface leakage currents. Each of these components may be minimized and therefore performance maximized by proper choice of material parameters and device design. In this paper a tradeoff analysis including thin base lateral diffusion (TBLD) as well as heterojunction (HJ) design concepts utilized to minimize dark current sources will be presented. A review of recent and current work on HgCdTe ion implantation and heterojunction technology including material growth, surface passivation and device fabrication will be presented and experimental results compared with predicted device performance.
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