掺铽纳米TiO2薄膜的自清洁性能

D. Wojcieszak, D. Kaczmarek, J. Domaradzki, Pietro Cremmellaro
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摘要

本文研究了掺杂Tb的透明TiO2涂层的光催化活性。采用高能反应磁控溅射工艺制备薄膜。在沉积过程中,金属Ti和Ti- tb靶在氧反应等离子体中溅射出颗粒。用几种方法对薄膜的性能进行了表征。利用x射线衍射和原子力显微镜分别研究了铽掺杂对表面结构和多样化的影响。通过光学透射率测量,确定了制备膜的光学性能,特别是透明度和吸附边。通过紫外可见光下苯酚分解反应,测定了TiO2:Tb薄膜的光催化活性。苯酚的分解速率是根据吸收测量来确定的。结果表明,所制备的薄膜均为纳米晶,具有光催化活性。掺入铽显著提高了沉积膜的活性。本文描述了TiO2基质的结构类型、晶粒大小、薄膜表面粗糙度与TiO2:Tb薄膜的光催化活性之间的关系。特别讨论了铽对TiO2基体性能的关键作用。
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Self-cleaning properties of nanocrystalline TiO2 thin films doped with terbium
In this work photocatalytic activity of transparent TiO2 coatings doped with Tb was described. Thin films were performed by high energy reactive magnetron sputtering process. During deposition, particles were sputtered from metallic Ti and Ti-Tb targets in oxygen reactive plasma. The properties of thin films were characterized by several methods. Influence of Tb-dopant on the structure and diversification of the surface was investigated by X-ray Diffraction and Atomic Force Microscopy, respectively. Optical properties of manufactured films, especially transparency level and adsorption edge, were determined based on optical transmission measurements. Photocatalytic activity of TiO2:Tb thin films was determined based on phenol decomposition reactions under UV-Vis light exposure. The rate of phenol decomposition was determined based on absorption measurements. The results have shown that all manufactured films were nanocrystalline and photocatalytically active. Doping with terbium meaningfully increased the activity of as-deposited films. In this paper dependences between structure type of the TiO2-matrix, crystallites size, roughness of the thin film surface and photocatalytic activity of TiO2:Tb thin films are described. Especially, the key-role of terbium on properties of TiO2 matrix is discussed.
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Front and back cover Theoretical and experimental analysis of single mode fiber-to-fiber joint loss due to lateral misalignment Cascaded fiber optic delay line filter for adaptive dispersion slope compensation Self-cleaning properties of nanocrystalline TiO2 thin films doped with terbium The selection of gas chemistry in reactive ion etching of AlGaN/GaN heterostructures
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