非常规镜面材料的散射与表面光洁度

J. Bennett, P. Archibald, A. Klugman
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引用次数: 0

摘要

在许多系统应用中,镜子材料除了具有良好的光学表面外,还需要具有高导热性,重量轻,热膨胀系数低,刚性,韧性或其他传统玻璃或熔融石英光学中不具备的特性组合。金属、陶瓷、半导体和其他材料被认为是镜面衬底。对极光滑、低散射表面的要求促使人们努力学习如何抛光几种非常规材料,并在某些情况下取得了良好的效果。我们将详细描述其中两种材料的抛光,硅和钼,也会提到其他材料。将展示所选材料的微分干涉对比(DIC)显微照片和表面轮廓,以及通过总积分散射(TIS)测量获得的均方根粗糙度值和直接用表面轮廓仪测量的粗糙度值。
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Scattering and Surface Finish of Unconventional Mirror Materials
In many systems applications, mirror materials are needed that have, in addition to a good optical surface, high thermal conductivity, light weight, a low thermal expansion coefficient, rigidity, toughness, or other combinations of properties not available in conventional glass or fused quartz optics. Metals, ceramics, semiconductors, and other materials have been considered for mirror substrates. The requirement of an extremely smooth, low scatter surface has spurred a large effort to learn how to polish several unconventional materials, and good results have been achieved in some cases. We will describe in detail the polishing of two of these materials, silicon and molybdenum, and will also mention others. Differential interference contrast (DIC) micrographs and surface profiles of selected materials will be shown, along with rms roughness values obtained from total integrated scattering (TIS) measurements and roughnesses measured directly with a surface profiling instrument.
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