一种新颖的、高度容限的数字电路设计方法

Rajesh Garg, S. Khatri
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引用次数: 24

摘要

本文提出了一种新的耐辐射CMOS标准单元库,并证明了其在实现抗辐射数字电路中的有效性。我们利用这样一个事实,即如果栅极仅使用PMOS (NMOS)晶体管实现,那么辐射粒子撞击只能导致逻辑上的0到1(1到0)翻转。基于这一观察,我们从常规静态CMOS栅极中推导出辐射硬化栅极。特别地,我们分离了PMOS和NMOS器件,并将门输出拆分为两个信号。我们的耐辐射门的其中一个输出是使用PMOS晶体管产生的,并且它驱动其他PMOS晶体管(仅)在其扇出。同样,另一个输出(由NMOS晶体管产生)只驱动其扇出中的其他NMOS晶体管。现在,如果辐射粒子击中容辐射门的一个输出,那么扇出中的门进入高阻抗状态,因此保持其输出值。我们的辐射硬化门具有极高的SEU容忍度,这在电路层面得到了验证。利用这些门,我们还实现了基于逻辑屏蔽的电路级强化,以选择性地强化电路中对电路软错误故障贡献最大的那些门。逻辑屏蔽概率较低的门被我们的新库中的SEU容限门所取代,从而使数字设计实现了90%的软错误率降低。实验结果表明,对于区域映射设计,这种减少分别为62%和29%的适度布局面积和延迟损失。与现有方法相比,我们的方法在极大的临界电荷值(>650fC)下具有SEU抗扰性。
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A novel, highly SEU tolerant digital circuit design approach
In this paper, we present a new radiation tolerant CMOS standard cell library, and demonstrate its effectiveness in implementing radiation hardened digital circuits. We exploit the fact that if a gate is implemented using only PMOS (NMOS) transistors then a radiation particle strike can result only in logic a 0 to 1 (1 to 0) flip. Based on this observation, we derive our radiation hardened gates from regular static CMOS gates. In particular, we separate the PMOS and NMOS devices, and split the gate output into two signals. One of these outputs of our radiation tolerant gate is generated using PMOS transistors, and it drives other PMOS transistors (only) in its fanout. Similarly, the other output (generated from NMOS transistors) drives only other NMOS transistors in its fanout. Now, if a radiation particle strikes one of the outputs of the radiation tolerant gate, then the gates in the fanout enter a high-impedance state, and hence preserve their output values. Our radiation hardened gates exhibit an extremely high degree of SEU tolerance, which is validated at the circuit level. Using these gates, we also implement circuit level hardening based on logical masking, to selectively harden those gates in a circuit which contribute most to the soft error failure of the circuit. The gates with a low probability of logical masking are replaced by SEU tolerant gates from our new library, such that the digital design achieves a 90% soft error rate reduction. Experimental results demonstrate that this reduction is achieved with a modest layout area and delay penalty of 62% and 29% respectively, for area mapped designs. In contrast with existing approaches, our approach results in SEU immunity for extremely large critical charge values (>650fC).
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