A. Smirnov, A. Ivanov, A. Kremleva, S. Sharofidinov, A. Romanov
{"title":"在Al2O3衬底上生长的正交Ga2O3薄膜中位错形成的应力松弛","authors":"A. Smirnov, A. Ivanov, A. Kremleva, S. Sharofidinov, A. Romanov","doi":"10.17586/2687-0568-2022-4-3-1-6","DOIUrl":null,"url":null,"abstract":"We analyze the preference of various types of misfit dislocation (MD) formation in film/substrate κ-Ga2O3/α-Al2O3 and κ (AlxGa1–x)2O3/κ-Al2O3 heterostructures. We consider two possibilities for variation in films growth orientation (defined by inclination angle ϑ) for these heterostructures with inclination axes about either [100] or [010] crystallographic directions. We study dependences of the critical film thickness for MD formation on the inclination angle ϑ for heterostructures under consideration. We find the presence of two special orientations (ϑ ~ 26° for [100] heterostructure, ϑ ~ 28° for [010] heterostructure, and ϑ = 90° for both inclination types) of κ-Ga2O3/α-Al2O3 heterostructures, for which the formation of MDs is energetically unfavorable. We show that formation of pure edge MDs is easier for [010] κ-(AlxGa1–x)2O3/κ-Al2O3 heterostructures than for [100] heterostructures, and it is vice versa for mixed MDs in these heterostructures.","PeriodicalId":332408,"journal":{"name":"Reviews on Advanced Materials and Technologies","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Stress Relaxation Due to Dislocation Formation in Orthorhombic Ga2O3 Films Grown on Al2O3 Substrates\",\"authors\":\"A. Smirnov, A. Ivanov, A. Kremleva, S. Sharofidinov, A. Romanov\",\"doi\":\"10.17586/2687-0568-2022-4-3-1-6\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We analyze the preference of various types of misfit dislocation (MD) formation in film/substrate κ-Ga2O3/α-Al2O3 and κ (AlxGa1–x)2O3/κ-Al2O3 heterostructures. We consider two possibilities for variation in films growth orientation (defined by inclination angle ϑ) for these heterostructures with inclination axes about either [100] or [010] crystallographic directions. We study dependences of the critical film thickness for MD formation on the inclination angle ϑ for heterostructures under consideration. We find the presence of two special orientations (ϑ ~ 26° for [100] heterostructure, ϑ ~ 28° for [010] heterostructure, and ϑ = 90° for both inclination types) of κ-Ga2O3/α-Al2O3 heterostructures, for which the formation of MDs is energetically unfavorable. We show that formation of pure edge MDs is easier for [010] κ-(AlxGa1–x)2O3/κ-Al2O3 heterostructures than for [100] heterostructures, and it is vice versa for mixed MDs in these heterostructures.\",\"PeriodicalId\":332408,\"journal\":{\"name\":\"Reviews on Advanced Materials and Technologies\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Reviews on Advanced Materials and Technologies\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.17586/2687-0568-2022-4-3-1-6\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Reviews on Advanced Materials and Technologies","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.17586/2687-0568-2022-4-3-1-6","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Stress Relaxation Due to Dislocation Formation in Orthorhombic Ga2O3 Films Grown on Al2O3 Substrates
We analyze the preference of various types of misfit dislocation (MD) formation in film/substrate κ-Ga2O3/α-Al2O3 and κ (AlxGa1–x)2O3/κ-Al2O3 heterostructures. We consider two possibilities for variation in films growth orientation (defined by inclination angle ϑ) for these heterostructures with inclination axes about either [100] or [010] crystallographic directions. We study dependences of the critical film thickness for MD formation on the inclination angle ϑ for heterostructures under consideration. We find the presence of two special orientations (ϑ ~ 26° for [100] heterostructure, ϑ ~ 28° for [010] heterostructure, and ϑ = 90° for both inclination types) of κ-Ga2O3/α-Al2O3 heterostructures, for which the formation of MDs is energetically unfavorable. We show that formation of pure edge MDs is easier for [010] κ-(AlxGa1–x)2O3/κ-Al2O3 heterostructures than for [100] heterostructures, and it is vice versa for mixed MDs in these heterostructures.