H. Miki, Ryota Sugii, T. Kawabata, Shigeki Tsuchitani
{"title":"PVDF微加工用于高分辨率皮肤触觉传感器","authors":"H. Miki, Ryota Sugii, T. Kawabata, Shigeki Tsuchitani","doi":"10.1109/ICSENST.2017.8304503","DOIUrl":null,"url":null,"abstract":"This work report PVDF micro machining process by RIE without much loss of its piezoelectric constant. L/S (70/130_μm) of fine structure was realized in this work with high etch rate. O<inf>2</inf> mixing feed gases of CF<inf>4</inf>, CHF<inf>3</inf>, SF<inf>6</inf> and 100 % of O<inf>2</inf> were used. At the condition of 100% O<inf>2</inf> gas plasma and at a higher of RF power, the better of surface state and higher of aspect ratio structure could be realized.","PeriodicalId":289209,"journal":{"name":"2017 Eleventh International Conference on Sensing Technology (ICST)","volume":"43 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"PVDF micro machining for the high resolution skin-like tactile sensors\",\"authors\":\"H. Miki, Ryota Sugii, T. Kawabata, Shigeki Tsuchitani\",\"doi\":\"10.1109/ICSENST.2017.8304503\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This work report PVDF micro machining process by RIE without much loss of its piezoelectric constant. L/S (70/130_μm) of fine structure was realized in this work with high etch rate. O<inf>2</inf> mixing feed gases of CF<inf>4</inf>, CHF<inf>3</inf>, SF<inf>6</inf> and 100 % of O<inf>2</inf> were used. At the condition of 100% O<inf>2</inf> gas plasma and at a higher of RF power, the better of surface state and higher of aspect ratio structure could be realized.\",\"PeriodicalId\":289209,\"journal\":{\"name\":\"2017 Eleventh International Conference on Sensing Technology (ICST)\",\"volume\":\"43 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 Eleventh International Conference on Sensing Technology (ICST)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICSENST.2017.8304503\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 Eleventh International Conference on Sensing Technology (ICST)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSENST.2017.8304503","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
PVDF micro machining for the high resolution skin-like tactile sensors
This work report PVDF micro machining process by RIE without much loss of its piezoelectric constant. L/S (70/130_μm) of fine structure was realized in this work with high etch rate. O2 mixing feed gases of CF4, CHF3, SF6 and 100 % of O2 were used. At the condition of 100% O2 gas plasma and at a higher of RF power, the better of surface state and higher of aspect ratio structure could be realized.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
