碳纳米管场效应管多值逻辑门设计及可靠性分析

Jinghang Liang, Jie Han, Linbin Chen, F. Lombardi
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引用次数: 12

摘要

随着纳米技术的发展,多值逻辑电路因其在信息密度和运算速度方面的优势而备受关注。本文提出了一种利用碳纳米管场效应晶体管(cntfet)实现的伪互补MVL设计。这种设计在工作中不使用电阻。考虑到cntfet的特性和制造的不理想性,提出了一种晶体管级可靠性分析方法来准确估计MVL栅极的误差率。这种方法考虑了门结构及其操作,因此它产生了比逻辑级可靠性分析更现实的框架。为了实现可扩展性,建立了随机计算模型来准确有效地分析MVL门;简要讨论了这些模型在电路中的推广。
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Design and reliability analysis of multiple valued logic gates using carbon nanotube FETs
With emerging nanometric technologies, multiple valued logic (MVL) circuits have attracted significant attention due to advantages in information density and operating speed. In this paper, a pseudo complementary MVL design is initially proposed for implementations using carbon nanotube field effect transistors (CNTFETs). This design utilizes no resistors in its operation. To account for the properties and fabrication non-idealities of CNTFETs, a transistor-level reliability analysis is proposed to accurately estimate the error rates of MVL gates. This approach considers gate structures and their operation, so it yields a more realistic framework than a logic-level analysis of reliability. To achieve scalability, stochastic computational models are developed to accurately and efficiently analyze MVL gates; the extension of these models to circuits is briefly discussed.
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