硅-锗量子级联的太赫兹子带间发射

R. Kelsall, Z. Ikonić, P. Harrison, S. Lynch, R. Bates, D. Paul, D. Norris, S. Liew, A. Cullis, D. Robbins, P. Murzyn, C. Pidgeon, D. D Arnone
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引用次数: 1

摘要

由于p型Si/SiGe量子级联结构中的轻空穴-重空穴子带间跃迁,在表面法向和边缘发射几何形状中都观察到了太赫兹电致发光。在Si/sub 0.8/Ge/sub 0.2/松弛缓冲或“虚拟衬底”上生长的100周期Si/sub 0.76/Ge/sub 0.24/ Si异质结构的表面发射中,已观察到高达50 nW的太赫兹输出功率。
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Terahertz intersubband emission from silicon-germanium quantum cascades
Terahertz electroluminescence due to light hole-heavy hole intersubband transitions in p-type Si/SiGe quantum cascade structures has been observed in both surface-normal and edge emission geometries. THz output powers of up to 50 nW have been observed for surface emission from 100 period Si/sub 0.76/Ge/sub 0.24//Si heterostructures grown on a Si/sub 0.8/Ge/sub 0.2/ relaxed buffer or 'virtual substrate'.
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