{"title":"动态掩模光刻系统的研制","authors":"Yih-Lin Cheng, Mengyao Li, Jiang-Hong Lin, J. Lai, Chang-Tai Ke, Yu-Chia Huang","doi":"10.1109/ICMECH.2005.1529302","DOIUrl":null,"url":null,"abstract":"Masks have played an important role in the lithography process, but it takes time and money to make a quartz mask. In rapid prototyping (RP) technologies, curing of photopolymers is mainly achieved by laser scanning with limited fabrication speed. In this project, the dynamic mask technology is implemented to develop a dynamic mask photolithography system which requires no expensive quartz mask and is expected to fabricate parts faster than laser scanning. Digital micro-mirror device (DMD) from digital light processing (DLP) technology by Texas Instruments is used as a dynamic mask generator. Instead of using visible light in DLP, UV light source is utilized, hence, more photopolymers can be used in this system.","PeriodicalId":175701,"journal":{"name":"IEEE International Conference on Mechatronics, 2005. ICM '05.","volume":"16 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"15","resultStr":"{\"title\":\"Development of dynamic mask photolithography system\",\"authors\":\"Yih-Lin Cheng, Mengyao Li, Jiang-Hong Lin, J. Lai, Chang-Tai Ke, Yu-Chia Huang\",\"doi\":\"10.1109/ICMECH.2005.1529302\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Masks have played an important role in the lithography process, but it takes time and money to make a quartz mask. In rapid prototyping (RP) technologies, curing of photopolymers is mainly achieved by laser scanning with limited fabrication speed. In this project, the dynamic mask technology is implemented to develop a dynamic mask photolithography system which requires no expensive quartz mask and is expected to fabricate parts faster than laser scanning. Digital micro-mirror device (DMD) from digital light processing (DLP) technology by Texas Instruments is used as a dynamic mask generator. Instead of using visible light in DLP, UV light source is utilized, hence, more photopolymers can be used in this system.\",\"PeriodicalId\":175701,\"journal\":{\"name\":\"IEEE International Conference on Mechatronics, 2005. ICM '05.\",\"volume\":\"16 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-07-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"15\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE International Conference on Mechatronics, 2005. ICM '05.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMECH.2005.1529302\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE International Conference on Mechatronics, 2005. ICM '05.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMECH.2005.1529302","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Development of dynamic mask photolithography system
Masks have played an important role in the lithography process, but it takes time and money to make a quartz mask. In rapid prototyping (RP) technologies, curing of photopolymers is mainly achieved by laser scanning with limited fabrication speed. In this project, the dynamic mask technology is implemented to develop a dynamic mask photolithography system which requires no expensive quartz mask and is expected to fabricate parts faster than laser scanning. Digital micro-mirror device (DMD) from digital light processing (DLP) technology by Texas Instruments is used as a dynamic mask generator. Instead of using visible light in DLP, UV light source is utilized, hence, more photopolymers can be used in this system.
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