Experimental characterization of LIGA fabricated 0.22 THz TWT circuits

In this paper we report precision MEMS Fabrication using novel LIGA technique for 0.22 THz micro-metallic staggered double-vane TWT circuits. For this high aspect ratio structure negative tone photo-resist KMPR was used. The entire fabrication process starting from spin coating, UV-lithography, electroforming and mold removal processing was fully characterized. Finally, the high tolerance TWT structure with smoothness (50–80 nm) was aligned in a specially engineered fixture for RF measurements in the BWO range 165–270GHz. The experiment showed excellent transmission 5–8 dB in frequency range 210–265 GHz. This result showed a distinct potential of applying this precision fabrication technique for the mass production of THz sources.