H. Gehring, M. Blaicher, Thomas Grottke, W. Pernice
{"title":"由直接激光写入实现的可重构纳米光子电路","authors":"H. Gehring, M. Blaicher, Thomas Grottke, W. Pernice","doi":"10.1364/cleo_at.2021.jth3a.12","DOIUrl":null,"url":null,"abstract":"Passive integrated nanophotonic circuits mass-produced by lithographic means offer limited customizability after nanofabrication. Here we present an approach for reconfiguring nanophotonic circuitry after lithography by using direct-laser-writing for application-specific tasks.","PeriodicalId":384075,"journal":{"name":"2021 Conference on Lasers and Electro-Optics (CLEO)","volume":"48 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Reconfigurable nanophotonic circuitry enabled by direct-laser-writing\",\"authors\":\"H. Gehring, M. Blaicher, Thomas Grottke, W. Pernice\",\"doi\":\"10.1364/cleo_at.2021.jth3a.12\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Passive integrated nanophotonic circuits mass-produced by lithographic means offer limited customizability after nanofabrication. Here we present an approach for reconfiguring nanophotonic circuitry after lithography by using direct-laser-writing for application-specific tasks.\",\"PeriodicalId\":384075,\"journal\":{\"name\":\"2021 Conference on Lasers and Electro-Optics (CLEO)\",\"volume\":\"48 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2021 Conference on Lasers and Electro-Optics (CLEO)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/cleo_at.2021.jth3a.12\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 Conference on Lasers and Electro-Optics (CLEO)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/cleo_at.2021.jth3a.12","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Reconfigurable nanophotonic circuitry enabled by direct-laser-writing
Passive integrated nanophotonic circuits mass-produced by lithographic means offer limited customizability after nanofabrication. Here we present an approach for reconfiguring nanophotonic circuitry after lithography by using direct-laser-writing for application-specific tasks.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
