面向纳米级FinFET技术的可靠性感知电路设计——新一代老化模型和电路可靠性模拟器

Shaofeng Guo, Runsheng Wang, Zhuoqing Yu, P. Hao, P. Ren, Yangyuan Wang, S. Liao, Chunyi Huang, Tianlei Guo, A. Chen, Jushan Xie, Ru Huang
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引用次数: 25

摘要

本文首次提出了一种工业级的新一代EDA解决方案,用于纳米级FinFET技术的可靠性感知设计,该解决方案采用了新的紧凑晶体管老化模型和升级的电路可靠性模拟器。我们的工作解决了FinFET硅数据NBTI老化的各种问题。特别是,在传统的仿真器中忽略或不太精确的NBTI恢复效应模型,提出了精确的NBTI退化和恢复模型,并在FinFET技术的全应力/恢复范围内通过硅数据进行了验证。在新的仿真方法的基础上,引入了历史效应,这是现有工业工具所缺少的NBTI的重要特征之一。针对FinFET可靠性数据表明传统的线性外推方法已不再有效的问题,提出了一种基于等效智能迭代流的快速准确的长期预测方法。目前备受关注的NBTI的频率依赖性被自动包含在新的仿真器中。这项工作已经集成到Cadence可靠性模拟器中,为设计人员提供了精确的可靠性感知电路设计的机会。
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Towards reliability-aware circuit design in nanoscale FinFET technology: — New-generation aging model and circuit reliability simulator
In this paper, an industry-level new-generation EDA solution for reliability-aware design in nanoscale FinFET technology is presented for the first time, with new compact transistor aging models and upgraded circuit reliability simulator. Our work solves various issues found in FinFET silicon data of NBTI aging. Especially, instead of ignoring or less accurate NBTI recovery effect model in traditional simulators, accurate NBTI degradation and recovery models are proposed and validated by silicon data for full stress/recovery range in the FinFET technology. The history effect, one of the important features of NBTI which is missing in the existing industrial tools, is included based on new simulation methodology. Since FinFET reliability data suggests the conventional linear extrapolation method is no longer valid, an accurate fast-speed long-term prediction method is proposed based on smart iteration flows of equivalence. The frequency dependence of NBTI, which draws much attention, is included in the new simulator automatically. This work has been integrated into Cadence reliability simulator, providing designers an opportunity for accurate reliability-aware circuit design.
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