带有Ni触点的4H-SiC二极管的电流-电压特性

M. Sochacki, M. Bakowski, J. Szmidt, A. Werbowy
{"title":"带有Ni触点的4H-SiC二极管的电流-电压特性","authors":"M. Sochacki, M. Bakowski, J. Szmidt, A. Werbowy","doi":"10.1109/WBL.2001.946604","DOIUrl":null,"url":null,"abstract":"Summary form only given. Results of research on the electric properties of Ni contacts on n-type 4H-SiC are presented. The forward and reverse I-V measurements of Ni/4H-SiC Schottky rectifiers are demonstrated. The studies showed degradation of the structures over time. The lack of passivation probably caused the increase of leakage current. The scatter of Schottky diode parameters like the ideality factor, the saturation current density, the series resistance and the Schottky barrier height were studied. The Schottky barrier height was calculated from I-V characteristics measured at room temperature.","PeriodicalId":246239,"journal":{"name":"Journal of Wide Bandgap Materials","volume":"104 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Current-voltage characteristics of 4H-SiC diodes with Ni contacts\",\"authors\":\"M. Sochacki, M. Bakowski, J. Szmidt, A. Werbowy\",\"doi\":\"10.1109/WBL.2001.946604\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Summary form only given. Results of research on the electric properties of Ni contacts on n-type 4H-SiC are presented. The forward and reverse I-V measurements of Ni/4H-SiC Schottky rectifiers are demonstrated. The studies showed degradation of the structures over time. The lack of passivation probably caused the increase of leakage current. The scatter of Schottky diode parameters like the ideality factor, the saturation current density, the series resistance and the Schottky barrier height were studied. The Schottky barrier height was calculated from I-V characteristics measured at room temperature.\",\"PeriodicalId\":246239,\"journal\":{\"name\":\"Journal of Wide Bandgap Materials\",\"volume\":\"104 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-06-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Wide Bandgap Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/WBL.2001.946604\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Wide Bandgap Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/WBL.2001.946604","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

只提供摘要形式。介绍了n型4H-SiC上Ni触点电性能的研究结果。演示了Ni/4H-SiC肖特基整流器的正向和反向I-V测量。研究表明,随着时间的推移,这些结构会退化。钝化不足可能导致漏电流增大。研究了理想因数、饱和电流密度、串联电阻和肖特基势垒高度等肖特基二极管参数的散射特性。肖特基势垒高度由室温下测得的I-V特性计算得到。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Current-voltage characteristics of 4H-SiC diodes with Ni contacts
Summary form only given. Results of research on the electric properties of Ni contacts on n-type 4H-SiC are presented. The forward and reverse I-V measurements of Ni/4H-SiC Schottky rectifiers are demonstrated. The studies showed degradation of the structures over time. The lack of passivation probably caused the increase of leakage current. The scatter of Schottky diode parameters like the ideality factor, the saturation current density, the series resistance and the Schottky barrier height were studied. The Schottky barrier height was calculated from I-V characteristics measured at room temperature.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Hydrogen Storage in Diamond Films Impurity Removal from 6H-SiC Using Field Enhanced Diffusion by Optical Activation Method Charge Carriers Removal from 4H-SiC Using Field Enhanced by Optical Activation Diffusion Method Sulfur and Sodium: Diffusion of Potential Donors into Natural Diamond Effective Work Function of Cathodes Consisting of Cubic Boron Nitride and Aluminum Nitride
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1