L. Nagy, D. Arbet, M. Kovác, M. Potocný, R. Ondica, V. Stopjaková
{"title":"基于gmb/ID方法的批量驱动电路设计EKV模型","authors":"L. Nagy, D. Arbet, M. Kovác, M. Potocný, R. Ondica, V. Stopjaková","doi":"10.1109/africon51333.2021.9570960","DOIUrl":null,"url":null,"abstract":"The paper addresses a development and application of EKV MOS transistor compact model with focus on the ultra low-voltage / ultra low-power analog integrated circuit (IC) design employing bulk-driven (BD) technique. The presented contribution can be viewed as an extension of standard EKV model application and as a contribution to ultra low-voltage IC design techniques. The paper compares the measured and extracted small-signal parameters of standalone transistor samples fabricated in 130 nm CMOS technology and the simulation results obtained using the proposed bulk-driven EKV v2.63 model and foundry-provided BSIM model v3.3. The transistor samples were analyzed with power supply of VDD = 0.4 V The paper also discusses the implementation of 3D graphs as a result of introducing another degree of freedom into the essential MOS transistor characteristics, while maintaining the ease of using the design hand-calculation with the original gm/ID approach.","PeriodicalId":170342,"journal":{"name":"2021 IEEE AFRICON","volume":"48 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"EKV Model for Bulk-Driven Circuit Design Using gmb/ID Method\",\"authors\":\"L. Nagy, D. Arbet, M. Kovác, M. Potocný, R. Ondica, V. Stopjaková\",\"doi\":\"10.1109/africon51333.2021.9570960\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The paper addresses a development and application of EKV MOS transistor compact model with focus on the ultra low-voltage / ultra low-power analog integrated circuit (IC) design employing bulk-driven (BD) technique. The presented contribution can be viewed as an extension of standard EKV model application and as a contribution to ultra low-voltage IC design techniques. The paper compares the measured and extracted small-signal parameters of standalone transistor samples fabricated in 130 nm CMOS technology and the simulation results obtained using the proposed bulk-driven EKV v2.63 model and foundry-provided BSIM model v3.3. The transistor samples were analyzed with power supply of VDD = 0.4 V The paper also discusses the implementation of 3D graphs as a result of introducing another degree of freedom into the essential MOS transistor characteristics, while maintaining the ease of using the design hand-calculation with the original gm/ID approach.\",\"PeriodicalId\":170342,\"journal\":{\"name\":\"2021 IEEE AFRICON\",\"volume\":\"48 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-09-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2021 IEEE AFRICON\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/africon51333.2021.9570960\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IEEE AFRICON","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/africon51333.2021.9570960","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
EKV Model for Bulk-Driven Circuit Design Using gmb/ID Method
The paper addresses a development and application of EKV MOS transistor compact model with focus on the ultra low-voltage / ultra low-power analog integrated circuit (IC) design employing bulk-driven (BD) technique. The presented contribution can be viewed as an extension of standard EKV model application and as a contribution to ultra low-voltage IC design techniques. The paper compares the measured and extracted small-signal parameters of standalone transistor samples fabricated in 130 nm CMOS technology and the simulation results obtained using the proposed bulk-driven EKV v2.63 model and foundry-provided BSIM model v3.3. The transistor samples were analyzed with power supply of VDD = 0.4 V The paper also discusses the implementation of 3D graphs as a result of introducing another degree of freedom into the essential MOS transistor characteristics, while maintaining the ease of using the design hand-calculation with the original gm/ID approach.