Fiheon Imroze, C. Mithun, Karunakaran Logesh, P. Venkatakrishnan, S. Dutta
{"title":"嵌入式电极对聚合物介质有机薄膜晶体管接触电阻的影响","authors":"Fiheon Imroze, C. Mithun, Karunakaran Logesh, P. Venkatakrishnan, S. Dutta","doi":"10.1109/DRC50226.2020.9135178","DOIUrl":null,"url":null,"abstract":"Even though there has been a significant progress in organic thin film transistor (OTFT), one of the major limitations that hinders the device performance is contact effect at the junction of semiconductor and source-drain contacts The effect becomes more effective while scaling down the channel length resulting in apparent mobility reduction, hysteresis etc. [1] . Efforts have been made to reduce contact resistance through the reduction of the metal-semiconductor injection barrier by either metal work function modification or by introducing a carrier injecting buffer layer. In this work, recessed drain-source structure on solution-processed polymer gate dielectric is demonstrated to realize bottom gate bottom contact (BGBC) OTFT based on poly[2,5-bis(3-tetradecylthiophen-2-yl)thieno[3,2- b]thiophene](PBTTT-C14) as semiconductor.","PeriodicalId":397182,"journal":{"name":"2020 Device Research Conference (DRC)","volume":"157 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Effect of recessed electrodes on contact resistance in Organic Thin Film Transistor based on polymer dielectric\",\"authors\":\"Fiheon Imroze, C. Mithun, Karunakaran Logesh, P. Venkatakrishnan, S. Dutta\",\"doi\":\"10.1109/DRC50226.2020.9135178\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Even though there has been a significant progress in organic thin film transistor (OTFT), one of the major limitations that hinders the device performance is contact effect at the junction of semiconductor and source-drain contacts The effect becomes more effective while scaling down the channel length resulting in apparent mobility reduction, hysteresis etc. [1] . Efforts have been made to reduce contact resistance through the reduction of the metal-semiconductor injection barrier by either metal work function modification or by introducing a carrier injecting buffer layer. In this work, recessed drain-source structure on solution-processed polymer gate dielectric is demonstrated to realize bottom gate bottom contact (BGBC) OTFT based on poly[2,5-bis(3-tetradecylthiophen-2-yl)thieno[3,2- b]thiophene](PBTTT-C14) as semiconductor.\",\"PeriodicalId\":397182,\"journal\":{\"name\":\"2020 Device Research Conference (DRC)\",\"volume\":\"157 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 Device Research Conference (DRC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DRC50226.2020.9135178\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 Device Research Conference (DRC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC50226.2020.9135178","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Effect of recessed electrodes on contact resistance in Organic Thin Film Transistor based on polymer dielectric
Even though there has been a significant progress in organic thin film transistor (OTFT), one of the major limitations that hinders the device performance is contact effect at the junction of semiconductor and source-drain contacts The effect becomes more effective while scaling down the channel length resulting in apparent mobility reduction, hysteresis etc. [1] . Efforts have been made to reduce contact resistance through the reduction of the metal-semiconductor injection barrier by either metal work function modification or by introducing a carrier injecting buffer layer. In this work, recessed drain-source structure on solution-processed polymer gate dielectric is demonstrated to realize bottom gate bottom contact (BGBC) OTFT based on poly[2,5-bis(3-tetradecylthiophen-2-yl)thieno[3,2- b]thiophene](PBTTT-C14) as semiconductor.