GaN HEMT器件中宽带漏极调制的优化

E. R. Srinidhi, R. Ma, A. Z. Markos, G. Kompa
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引用次数: 3

摘要

本文的重点是优化宽带包络终端,为未来的UMTS-LTE系统提供可靠的设备表征。利用补偿网络克服了在宽带测量中通常被忽略的直流馈电寄生效应,抑制了8倍500毫安GaN HEMT中的漏极偏置调制。漏极调制指数(DMI)度量用于量化漏极电压调制的程度作为载波间距的函数,并且在漏极偏压补偿后,DMI可降低80%。在实验分析的基础上,设计了一种简单的偏置三通,可以克服不合适的直流馈电条件。在2载波连续波和W-CDMA激励下,利用内部偏置三通实现了最大19 dB和18 dB的IMD3抑制,并最大限度地减少了IMD不对称,强调了宽带偏置网络设计的重要性。
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Optimization of broadband drain modulation in GaN HEMT devices
This paper focuses on the optimization of broadband envelope termination for reliable device characterization for future UMTS-LTE systems. Drain bias modulation is suppressed in 8times500 mum GaN HEMT using compensation network overcoming the parasitic effects of the DC feed, generally ignored during broadband measurements. Drain modulation index (DMI) metric is defined for quantifying the extent of drain voltage modulation as a function of carrier spacing and up to 80% reduction in DMI is achieved after drain bias compensation. Further, based on the experimental analysis, a simple bias tee is designed which can overcome improper DC feed conditions. Under 2-carrier CW and W-CDMA excitation, maximum of 19 dB and 18 dB IMD3 suppression together with the minimization of IMD asymmetry, were achieved using in- house bias tee, emphasizing the importance of broadband bias network design.
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