K. Shibata, S. Konno, K. Takahashi, S. Mukaigawa, K. Takaki, K. Yukimura
{"title":"150khz波段高功率突发电感耦合等离子体的电学和等离子体特性","authors":"K. Shibata, S. Konno, K. Takahashi, S. Mukaigawa, K. Takaki, K. Yukimura","doi":"10.1109/PPC.2017.8291295","DOIUrl":null,"url":null,"abstract":"Plasma source of an inductively coupled plasma (ICP) driven by high voltage burst pulse has been developed. A 200 ps wide burst of 157 kHz power supply was used to produce plasma with repetition rate of 1 Hz. The electrical and plasma parameters are obtained based on mutual induction circuit model by analyzing waveforms of the coil current and the voltage. The plasma density was also obtained using a double probe measurement. The results showed that electrical power into plasma was obtained as 13.1 kW. The plasma density was obtained to be 1019 m−3 order by the equivalent circuit, which is good agreement with that obtained with probe measurement.","PeriodicalId":247019,"journal":{"name":"2017 IEEE 21st International Conference on Pulsed Power (PPC)","volume":"104 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Electrical and plasma characteristics of 150 kHz band high-power burst inductively coupled plasma\",\"authors\":\"K. Shibata, S. Konno, K. Takahashi, S. Mukaigawa, K. Takaki, K. Yukimura\",\"doi\":\"10.1109/PPC.2017.8291295\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Plasma source of an inductively coupled plasma (ICP) driven by high voltage burst pulse has been developed. A 200 ps wide burst of 157 kHz power supply was used to produce plasma with repetition rate of 1 Hz. The electrical and plasma parameters are obtained based on mutual induction circuit model by analyzing waveforms of the coil current and the voltage. The plasma density was also obtained using a double probe measurement. The results showed that electrical power into plasma was obtained as 13.1 kW. The plasma density was obtained to be 1019 m−3 order by the equivalent circuit, which is good agreement with that obtained with probe measurement.\",\"PeriodicalId\":247019,\"journal\":{\"name\":\"2017 IEEE 21st International Conference on Pulsed Power (PPC)\",\"volume\":\"104 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 IEEE 21st International Conference on Pulsed Power (PPC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PPC.2017.8291295\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 IEEE 21st International Conference on Pulsed Power (PPC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PPC.2017.8291295","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Electrical and plasma characteristics of 150 kHz band high-power burst inductively coupled plasma
Plasma source of an inductively coupled plasma (ICP) driven by high voltage burst pulse has been developed. A 200 ps wide burst of 157 kHz power supply was used to produce plasma with repetition rate of 1 Hz. The electrical and plasma parameters are obtained based on mutual induction circuit model by analyzing waveforms of the coil current and the voltage. The plasma density was also obtained using a double probe measurement. The results showed that electrical power into plasma was obtained as 13.1 kW. The plasma density was obtained to be 1019 m−3 order by the equivalent circuit, which is good agreement with that obtained with probe measurement.