非氟化和氟化3,4-二羟基-5-(羟甲基)脯氨酸的结构模拟及电子和介电性能研究

H. R. Sreepad
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摘要

基于密度泛函理论的第一性原理计算已经完成了技术上重要的脯氨酸衍生物(3,4-二羟基-5-(羟甲基)(脯氨酸)[????6????11????????5]。对材料的三斜结构进行了模拟,得到结构参数为a=4.309Å, b=6.004Å, c=6.967Å, ????=103.47????, ? ? = 103.17 ? ?, = 99.80 ? ?。氟化后的结构参数为a=4.301Å, b=6.214Å, c=7.113Å, ????=105.10????, ? ? = 104 ? ?, = 97.68 ? ?。利用Quantum-Espresso的电子结构计算程序计算了该材料的电子态密度(Electronic Density of state, edo),得到带隙为4.47 eV。氟化后的带隙为3.34 eV。得到材料在x、y、z轴上的介电常数分别为2.32、2.70、2.61,平均值为2.54。氟化后化合物沿x、y、z轴的介电常数分别为2.38、2.56、2.56,平均值为2.50。计算的声子模式范围从101????????−1 ~ 3157????????氟化后声子模式范围从306????????−1 ~ 3563????????
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Structure Simulation and Study of Electronic and Dielectric Properties of Unfluorinated and Fluorinated 3,4-Dihydroxy-5-(Hydroxymethyl)Proline
First-principles calculations based on Density Functional Theory have been done on the technologically important Proline derivative (3,4-Dihydroxy-5-(hydroxymethyl)(proline) [????6????11????????5]. The triclinic structure of the material has been simulated and the structural parameters are found to be a=4.309Å, b=6.004Å, c=6.967Å, ????=103.47????, ????=103.17????, ????=99.80????. After fluorination the structural parameters are found to be a=4.301Å, b=6.214Å, c=7.113Å, ????=105.10????, ????=104????, ????=97.68????. Electron Density of States (EDOS) has been computed in the material using the Electronic structure calculation code of Quantum-Espresso which gives a Band gap of 4.47 eV. After fluorination the Band gap is found to be 3.34 eV. The value of dielectric constant in the material comes out to be 2.32, 2.70 and 2.61 along x, y and z axes respectively and the average value comes out to be 2.54. After fluorination the dielectric constant of the compound comes out to be be 2.38, 2.56 and 2.56 along x,y and z axes respectively the average value comes to be 2.50. The computed phonon modes range from 101????????−1 to 3157????????−1. After fluorination the phonon modes range from 306????????−1 to 3563????????−1.
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