采用标准的0.35µm CMOS工艺制作了具有压阻式位置传感的MEMS可变电容器

N. Zahirović, R. Mansour, Ming Yu
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引用次数: 5

摘要

提出了一种具有压阻反馈的可变MEMS电容。该电容器采用商用0.35 μ m CMOS工艺制造,并经过MEMS后处理。本文提出了一种压阻式传感方案,能够控制CMOS-MEMS可变电容中的磁滞效应。该传感方案的潜在应用包括可变电容的闭环控制和介质充电的检测。
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A MEMS variable capacitor with piezoresistive position sensing fabricated in a standard 0.35 µm CMOS process
A variable MEMS capacitor with piezoresistive feedback is presented. The capacitor is fabricated in a commercial 0.35 µm CMOS process with MEMS post-processing. The work presented demonstrates a piezoresistive sensing scheme capable of controlling hysteresis effects in a CMOS-MEMS variable capacitor. Potential applications of the sensing scheme include closed-loop control of variable capacitors and detection of dielectic charging.
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