{"title":"用时域有限差分法分析平面光波导中深刻蚀沟槽","authors":"Jun Wang, Mingyu Li, Jian-jun He","doi":"10.1109/AOE.2007.4410758","DOIUrl":null,"url":null,"abstract":"A finite-difference time-domain (FDTD) method is presented for simulating deep etched trench structures in planar optical waveguides. Numerical results obtained from FDTD simulations and from the transfer matrix method (TMM) are compared. The effect of sidewall verticality is analyzed.","PeriodicalId":370885,"journal":{"name":"2007 Asia Optical Fiber Communication and Optoelectronics Conference","volume":"43 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Analysis of deep etched trench in planar optical waveguide by FDTD method\",\"authors\":\"Jun Wang, Mingyu Li, Jian-jun He\",\"doi\":\"10.1109/AOE.2007.4410758\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A finite-difference time-domain (FDTD) method is presented for simulating deep etched trench structures in planar optical waveguides. Numerical results obtained from FDTD simulations and from the transfer matrix method (TMM) are compared. The effect of sidewall verticality is analyzed.\",\"PeriodicalId\":370885,\"journal\":{\"name\":\"2007 Asia Optical Fiber Communication and Optoelectronics Conference\",\"volume\":\"43 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-12-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2007 Asia Optical Fiber Communication and Optoelectronics Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/AOE.2007.4410758\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 Asia Optical Fiber Communication and Optoelectronics Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/AOE.2007.4410758","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Analysis of deep etched trench in planar optical waveguide by FDTD method
A finite-difference time-domain (FDTD) method is presented for simulating deep etched trench structures in planar optical waveguides. Numerical results obtained from FDTD simulations and from the transfer matrix method (TMM) are compared. The effect of sidewall verticality is analyzed.
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