Applications of control and signal processing to the microlithographic process

An overview is given describing applications of multivariable control, signal processing, optimization, modeling and computation to the lithography sequence. We discuss areas in the patterning process where mathematical methods can play a significant role including optical proximity correction, phase shifting mask design, alignment, and stage control for nanopositioning. A novel patterning method, based on using polymer conformable membranes possessing and 1:1 binary spatial permeability to vapor phase reactants for chemical modification of the substrate surface, is presented. A section on systems applications in the general area of photoresist processing for lithography with emphasis on the thermal process is also presented. We also discuss the research now underway for both the nanofabrication technique and the thermal system used for photoresist processing.