异步并行遗传算法的拥塞驱动布局技术

M. Yoshikawa, H. Terai
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引用次数: 2

摘要

0.18微米及以下的深亚微米技术(DSM)使具有超过1000万个门的逻辑电路集成成为可能。在这种需求侧管理技术中,布局设计成为最重要的设计阶段。本文讨论了一种基于异步并行遗传算法的新型拥塞驱动布局技术。该算法具有两级层次结构。在选择控制方面,引入了新的线路拥塞和芯片面积目标函数。并介绍了两种适合分层处理的并行处理,以减少运行时间。实验结果表明,与传统的布局技术相比,有了很大的改进。
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Asynchronous parallel genetic algorithm for congestion-driven placement technique
Deep-sub-micron technology (DSM) of 0.18 micron and below enable the integration of logical circuits having more than 10 million gates. In such a DSM technology, layout design has become the most important design phase. This paper discusses a novel congestion-driven placement technique based on asynchronous parallel genetic algorithm. The proposed algorithm has a two-level hierarchical structure. For selection control, new objective functions are introduced for wire congestion and chip area. Moreover, the two kind of parallel processing suitable for hierarchical processing is introduced for reduction of run time. Experimental results show improvement comparison with conventional layout technique.
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