亚微米领域的可制造性设计

Wojciech Maly, H. Heineken, J. Khare, P. Nag
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引用次数: 55

摘要

新兴集成电路技术的关键特性使得传统的最小化模具尺寸概念和传统的“设计规则”不足以处理设计-制造界面。本教程调查了与亚微米集成电路的可制造性相关的设计和工艺特征。讨论还涵盖了可制造性设计(DFM)权衡分析。还解释了分析这些权衡所需的收益和成本模型。
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Design for manufacturability in submicron domain
Key characteristics of newly emerging IC technologies render the traditional concept of die size minimization and traditional "design rules" insufficient to handle the design-manufacturing interface. This tutorial surveys the design and process characteristics relevant to the manufacturability of submicron ICs. The discussion also covers analysis of design for manufacturability (DFM) trade-offs. Yield and cost models needed to analyze these trade-offs are explained as well.
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