共溅射制备cd - cd -Au多晶薄膜的Au掺杂研究

M. Becerril, H. Silva-Lopez, O. Zelaya-Ángel, J. R. Vargas-Garcia
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引用次数: 7

摘要

采用室温共溅射的方法,在康宁玻璃衬底上生长了金掺杂CdS多晶薄膜。元素Cd和Au被放置在覆盖小区域的Cd靶上。分析了其电学、结构和光学性质与Au含量的关系。金掺杂CdS多晶薄膜呈现p型半导体性质。结果发现,由于Au在CdS晶格内的掺入,其电阻率下降,载流子浓度增加。在这两种情况下,变化都是几个数量级。
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Au doping of CdS polycrystalline films prepared by co-sputtering of CdS–Cd-Au targets
Au doped CdS polycrystalline films were grown on Corning glass substrates at room temperature by co-sputtering from a CdS–Cd–Au target. Elemental Cd and Au were placed onto the CdS target covering small areas. The electrical, structural, and optical properties were analyzed as a function of Au content. The Au doped CdS polycrystalline films showed a p-type semiconductor nature. It was found that the electrical resistivity drops and the carrier concentration increases as a consequence of Au incorporation within the CdS lattice. In both cases, the changes were of several orders of magnitude. 
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