利用新型红外相机和宽带梯队光谱仪对薄膜涂层进行分析

S. Pappas, B. Beardsley, George Ritchie
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引用次数: 0

摘要

梯队光谱仪可以在宽光谱范围内提供高分辨率(波长/FWHM)。这些光学仪器通常用于光谱,用于天文观测和实验室分析中的原子和分子识别。梯队光谱仪的波长范围最终受到用于获取光谱数据的探测器能力的限制。硅基CCD、EMCCD和CMOS传感器通常可以测量200nm到1100nm的波长。红外实验室和卡特琳娜科学仪器公司(CSI)合作演示了一种将红外实验室的TRIWAVE相机与CSI的EMU120/65梯队光谱仪相结合的应用。TRIWAVE相机的光谱范围为300nm至1600nm,大大增加了使用EMU-120/65光谱仪的波长范围。随着这种能力的提高,通过从光谱数据中提取和分析干涉条纹来测量薄膜的介电涂层厚度成为可能。本文将介绍测量的方法和结果。
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Thin film coating analysis using a novel IR camera and a broadband Echelle spectrograph
An echelle spectrograph can provide high resolving power (wavelength/FWHM) across a broad spectral range. These optical instruments are commonly used in spectroscopy for atomic and molecular identification in astronomical observations and laboratory analysis. The wavelength range of an echelle spectrograph is ultimately limited by the capabilities of the detector used to acquire the spectral data. Silicon based CCD, EMCCD and CMOS sensors typically enable measurements from 200nm to 1100nm. Infrared Laboratories and Catalina Scientific Instruments (CSI) have collaborated to demonstrate an application that combines IR Lab’s TRIWAVE camera with CSI’s EMU120/65 echelle spectrograph. The TRIWAVE camera covers a spectral range of 300nm to 1600nm, greatly increasing the wavelength range for applications using the EMU-120/65 spectrograph. With this increased capability, an opportunity exists for measuring the dielectric coating thickness of thin film by extracting and analyzing interference fringes from the spectral data. Methods and results of this measurement will be presented.
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