GaN高性能功率放大器和基于GaN的射频前端的新型封装、冷却和互连方法

A. Margomenos, M. Micovic, A. Kurdoghlian, K. Shinohara, D. Brown, C. Butler, I. Milosavljevic, P. B. Hasimoto, R. Grabar, P. Willadsen, R. Bowen, P. Patterson, M. Wetzel, D. Chow
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引用次数: 7

摘要

我们报告了一种低成本,可扩展的RF前端封装的新方法,该方法使“已知好的芯片”GaN mmic能够与其他ic (Si, SiGe等)和无源相结合,在集成的3D封装中,包括RF互连和冷却。电铸散热器还用作创建射频前端的基板。我们称这种多用途层为集成热阵列板(ITAP)。与使用AuSn焊料的传统安装GaN功率放大器(PA)相比,ITAP x波段PA的连续输出功率提高了1.4倍(8 GHz时为4.4W),而ITAP ku波段PA的连续输出功率提高了1.3倍(12 GHz时为4W)。与环氧银贴片相比,性能分别提高了2倍和1.5倍。此外,通过使用弯曲的GaN栅极结构,我们证明当耗散功率为2W/mm时,ITAP将结温降低了40°C,当结温保持在150°C时,ITAP将功率处理提高了1.45倍。
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Novel packaging, cooling and interconnection method for GaN high performance power amplifiers and GaN based RF front-ends
We report a new approach for low-cost, scalable RF front-end packaging that enables “known good die” GaN MMICs to be combined with other ICs (Si, SiGe etc) and passives in an integrated 3D package that includes RF interconnects and cooling. The electroformed heat sink also serves as the substrate for creating the RF front-end. We call this multi-purpose layer the Integrated Thermal Array Plate (ITAP). Compared to conventionally mounted GaN power amplifiers (PA) using AuSn solder, the ITAP X-band PA showed 1.4× improvement in CW Pout (4.4W at 8 GHz) while the ITAP Ku-band showed 1.3× improvement in CW Pout (4W at 12 GHz). Compared to silver epoxy mounted PAs the improvement was 2× and 1.5× respectively. Additionally, by using a meandered GaN gate structure we demonstrated that the ITAP reduces the junction temperature by 40°C when the dissipated power is at 2W/mm or increases the power handling by 1.45× when the junction temperature is held at 150°C.
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