导论章:阵列模式优化的介绍

Khalil H. Sayidmarie, J. Mohammed
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引用次数: 0

摘要

阵列天线提供了多功能和灵活的解决方案,以满足所需的辐射模式的要求。阵列的总场可以通过五个阵列参数来控制,这五个阵列参数是主要的设计参数[1]。这些是:阵列元素的几何布局及其间距,单个元素的激励幅度和相位,最后是单个元素的图案。这些因素已被许多使用解析或数值方法的阵列合成技术所利用。这些技术已被广泛研究,并有充分的文献记录[2,3]。本章旨在介绍旨在改进和优化阵列天线辐射方向图的最新技术。
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Introductory Chapter: Introduction to Array Pattern Optimization
Array antennas offer versatile and flexible solutions to the requirement for desired radiation patterns. The total field of the array can be controlled by five array parameters that are the main design parameters [1]. These are: the geometrical layout of the array elements and their spacings, the excitation amplitude and phase of the individual elements, and finally the pattern of the individual elements. These factors have been utilized by many array synthesis techniques that use either analytical or numerical approaches. These techniques have been extensively studied and are well documented [2, 3]. This chapter aims at presenting recent techniques that aim to improve and optimize the radiation pattern of array antennas.
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